就是中国己在EUV光刻机自产取得进展。旦做出了原型EUV光刻机。且路透社报道过。
Key Developments:
- Prototype Success: A covert project has successfully generated EUV light with a large-scale prototype in Shenzhen, reports Reuters, using former engineers from ASML and acquired second-hand parts.
- Secrecy & Scale: The project is highly classified, with engineers using fake IDs, operating in a secure facility to keep it hidden from the West.
- Goal: China aims to produce working advanced chips with its own machines by 2028, though 2030 might be more realistic, according to sources cited by Reuters.
- Reverse Engineering: The team reverse-engineered key components, using older ASML parts to build their system, notes Sherwood News.
- National Priority: This effort is a cornerstone of President Xi Jinping's drive for tech independence, with Huawei playing a key role.
Implications:
- Challenging ASML: This challenges ASML's dominance in EUV, essential for cutting-edge AI and tech.
- Self-Sufficiency: It marks a significant step towards China's goal of eliminating reliance on Western tech.
- Hybrid Approach: China is also developing compact, cheaper EUV light sources using High-Harmonic Generation (HHG) for research and smaller batches, notes Interesting Engineering.
Context:
- EUV (Extreme Ultraviolet) lithography is the most advanced chipmaking technology, crucial for producing powerful processors.
- The US has restricted China's access to this technology, making China's domestic efforts vital for its AI and tech ambitions.
